Sputtering is the process of forming a thin film when the object is attached to the target substrate by the sputtering and scattering, and the sputtering target is the material for high-speed particle bombardment. In this report, we counted the high purity sputtering target material with 4N (purity≥99.99%).
This report contains market size and forecasts of High Purity Metal Sputtering Target Material in global, including the following market information:
Global High Purity Metal Sputtering Target Material Market Revenue, 2017-2022, 2023-2028, ($ millions)
Global High Purity Metal Sputtering Target Material Market Sales, 2017-2022, 2023-2028, (Kiloton)
Global top five High Purity Metal Sputtering Target Material companies in 2021 (%)
The global High Purity Metal Sputtering Target Material market was valued at million in 2021 and is projected to reach US$ million by 2028, at a CAGR of % during the forecast period.
The U.S. Market is Estimated at $ Million in 2021, While China is Forecast to Reach $ Million by 2028.
Precious Metal Sputtering Targets Segment to Reach $ Million by 2028, with a % CAGR in next six years.
The global key manufacturers of High Purity Metal Sputtering Target Material include Praxair (Linde), JX Nippon Mining & Metals Corporation, Materion, Honeywell, Ningbo Jiangfeng, ULVAC, TOSOH, Luvata and Hitachi Metals, etc. In 2021, the global top five players have a share approximately % in terms of revenue.
MARKET MONITOR GLOBAL, INC (MMG) has surveyed the High Purity Metal Sputtering Target Material manufacturers, suppliers, distributors and industry experts on this industry, involving the sales, revenue, demand, price change, product type, recent development and plan, industry trends, drivers, challenges, obstacles, and potential risks.
Total Market by Segment:
Global High Purity Metal Sputtering Target Material Market, by Type, 2017-2022, 2023-2028 ($ Millions) & (Kiloton)
Global High Purity Metal Sputtering Target Material Market Segment Percentages, by Type, 2021 (%)
Precious Metal Sputtering Targets
Ordinary Metal Sputtering Targets
Global High Purity Metal Sputtering Target Material Market, by Application, 2017-2022, 2023-2028 ($ Millions) & (Kiloton)
Global High Purity Metal Sputtering Target Material Market Segment Percentages, by Application, 2021 (%)
Semiconductor
Solar Energy
Flat Panel Display
HDD
Others
Global High Purity Metal Sputtering Target Material Market, By Region and Country, 2017-2022, 2023-2028 ($ Millions) & (Kiloton)
Global High Purity Metal Sputtering Target Material Market Segment Percentages, By Region and Country, 2021 (%)
North America
US
Canada
Mexico
Europe
Germany
France
U.K.
Italy
Russia
Nordic Countries
Benelux
Rest of Europe
Asia
China
Japan
South Korea
Southeast Asia
India
Rest of Asia
South America
Brazil
Argentina
Rest of South America
Middle East & Africa
Turkey
Israel
Saudi Arabia
UAE
Rest of Middle East & Africa
Competitor Analysis
The report also provides analysis of leading market participants including:
Key companies High Purity Metal Sputtering Target Material revenues in global market, 2017-2022 (Estimated), ($ millions)
Key companies High Purity Metal Sputtering Target Material revenues share in global market, 2021 (%)
Key companies High Purity Metal Sputtering Target Material sales in global market, 2017-2022 (Estimated), (Kiloton)
Key companies High Purity Metal Sputtering Target Material sales share in global market, 2021 (%)
Further, the report presents profiles of competitors in the market, key players include:
Praxair (Linde)
JX Nippon Mining & Metals Corporation
Materion
Honeywell
Ningbo Jiangfeng
ULVAC
TOSOH
Luvata
Hitachi Metals
TANAKA
Sumitomo Chemical
Plansee SE
Fujian Acetron New Materials Co., Ltd
FURAYA Metals Co., Ltd
Luoyang Sifon Electronic Materials
Changzhou Sujing Electronic Material
Umicore Thin Film Products
GRIKIN Advanced Material Co., Ltd.
Advantec
Angstrom Sciences